Overlay accuracy limitations of soft stamp UV nanoimprint lithography and circumvention strategies for device applications

S.l.] / Elsevier (2018) [Journal Article]

Microelectronic engineering
Volume: 197
Page(s): 83-86

Authors

Selected Authors

Cegielski, P. J.
Bolten, J.
Kim, J. W.
Schlachter, F.
Nowak, C.

Other Authors

Wahlbrink, T.
Giesecke, A. L.
Lemme, Max Christian

Identifier